Chlorine Trifluoride, Silane and Trimethylaluminum in the Semiconductor Facility, Unique ER and Safety Challenges

Ngai, Eugene
(Air Products and Chemicals, Allentown, PA)

As the Semiconductor industry continues to grow some materials present significant safety and emergency response challenges. Silane is the most common and has been involved in a number of incidents and fatalities over the last 20 years. It has been the subject of numerous studies. Chlorine Trifluoride is the most reactive gas used in the Fab has been involved in a number of incidents in the last 3 years. Organometallic materials like Trimethylaluminum (pyrophoric and violently water reactive) have been used in small quantities in the Compound Semiconductor industry for many years, it is now finding new uses in the Silicon Device industry as a dielectric. These materials present a unique challenge in establishing safety controls and developing emergency response procedures. This presentation will summarize the hazards of these gases and liquid, incidents, release testing and ER procedures.

Back to SESHA 29th Annual Symposium (2007)



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