Fate of HBr during F-GHG Abatement
Joe Van Gompel; Jim L\\\’Heureux; Michael Larsen
(Applied Materials, Santa Clara CA)
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Some semiconductor etch processes utilize HBr or a combination of HBr + Cl2, along with fluorinated greenhouse gases (F-GHGs) such as SF6, CF4, and others. Burn-wet abatement is commonly used to destroy the F-GHGs. A new abatement approach will be discussed for abatement of these materials.