Novel F2 Analysis from Semiconductor Process Emissions
Gaseous fluorine (F2) emissions are common from some semiconductor processes, for example where NF3 is used to produce F2 for chamber cleans. F2 is difficult to measure in these emissions due to its corrosive nature and complications / restrictions related to F2 calibration mixtures. A method has been developed to generate in situ F2 calibration standards using a novel technique. This technique enables passivation of the sampling system as well as calibration for measurement of F2 over a wide range of concentrations down to ppm levels.