Param Subramanian
P. Subramanian received his Bachelor of Chemical Engineering from the University of Mumbai, India and an M.S. degree in chemical engineering from the University of Idaho (Moscow, Idaho USA) in 2012, where he developed methods to separate single-stranded DNA through pulsatile electroosmotic flow in a micro-electromechanical chip. He joined the Process Hazard Analysis (PHA) department of Micron Technology, Inc. (Boise, Idaho USA) in 2012 and focuses on process safety in thin films and dry etch process technologies. He has led more than 20 Hazard and Operability Studies of First-of-a-Kind semiconductor films deposition and etch systems. His research interests include inline detection systems in semiconductor exhaust systems.