Student Paper: Arsenic Exposure in Gallium Arsenide Device Manufacturing: An Evaluation of Control Methods during Molecular Beam Epitaxy (MBE) Maintenance

Student Paper: Arsenic Exposure in Gallium Arsenide Device Manufacturing: An Evaluation of Control Methods during Molecular Beam Epitaxy (MBE) Maintenance 
Sara Ash ; University of California at Berkeley, School of Public Health, Industrial Hygiene Graduate Program

Special hazards exist during maintenance of Molecular Beam Epitaxy (MBE) systems used for GaAs device manufacturing when the reactor chamber must be accessed. This paper summarizes an arsenic exposure evaluation conducted during a maintenance task on a MBE system on the University of California at Berkeley campus and describes some exposure control methods that are used in industry and academic settings. Ten recommendations to reduce arsenic exposure during MBE maintenance tasks are provided that can be used in R&D and academic settings, such as the UC Berkeley Integrated Materials Laboratory where exposure monitoring was conducted.