The Application of Chlorine Trifluoride for Semiconductor Process Tool Cleaning

The Application of Chlorine Trifluoride for Semiconductor Process Tool Cleaning 
Conrad T. Sorenson – Praxiar, Inc. (SSA Journal Volume 12 Number 4 – Winter 1998 pp. 19 – 27 )

CIF3, or chlorine trifluoride, is emerging as an in situ method of cleaning semiconductor process tools. Traditionally, process tools have been cleaned using manual procedures. In the last several years, in situ cleaning techniques have been developed using PFCs. In this article, CIF3 cleans are compared to both manual cleaning methods as well as PFC cleaning methods. Environmental factors of the three cleaning methods are discussed. Because CIF3 present handling issues, these are touched upon and materials compatibility is discussed.