Abatement of Fluorine Process Emissions Utilizing Point-of-Use Abatement with Steam Injection

Jones, Robert (Lucent Technologies)
Flippo, Belynda (ATMI)

You must log in to view the full proceedings.

The industry-wide focus on the reduction of perfluorinated compound (PFC) emissions has prompted the employment of alternative process chemistries and process tool optimization for dry etch and chamber clean processes. The PFC reduction efforts, however, have resulted in an increase in toxic and corrosive fluorine (F2) gas emissions and the subsequent abatement requirements. ATMI has focused significant efforts upon the development of an efficient and cost-effective point-of-use abatement solution for the reduction of F2, and other fluorinated byproducts, such as hydrogen fluoride (HF) and silicon tetrafluoride (SiF4). ATMI’s efforts have resulted in the development of a non-fuel abatement system (use of steam in oxidation section). This report documents the qualification of the ATMI CDO? 863 for F2 abatement on a nitrogen trifluoride (NF3) chamber clean at a semiconductor manufacturing facility.

Back to SESHA 23rd Annual Symposium (2001)



Already have an account?