Challenges of Copper Waste Water Treatment in R&D Labs

Huynh, Tom; Gopalakrishna, Varun
(Applied Materials, Santa Clara, CA and EORM® Inc., Sunnyvale, CA)

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Treatment of copper contaminated wastewater from CMP applications poses significant challenges. There are a host of technologies (ranging from “back-pad” to point-of-use”) that have been employed with varying success. The problem is all the more challenging in an R&D environment where process recipes are changing on a daily basis. The presentation will focus on various combination solutions that have been implemented and the level of effectiveness of each.

Back to SESHA 26th Annual Symposium (2004)



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