Computer based monitoring of F-GHG emissions in Semiconductor Fabs
Neuber, Dr. Andreas; McIntosh, PhD, Monique; Cayer, Maxime
(Andreas Neuber, Monique McIntosh, Maxime Cayer, Shaun Crawford, Andrew Herbert, John Dickinson,Applied Materials, Santa Clara, USA)
You must log in to view the full proceedings.
LoginRegulatory compliance is an increasing issue for the semiconductor industry, see for example the US EPA Fluorinated Green House Gas (F-GHG) and N2O usage and emissions reporting regulations. Applied Materials has developed a method to help track these emission and to support compliance with new regulations. The results can then be used to compare to stack emission reports, but especially for apportioning, planning and forecasting of F-GHG and N2O emissions. Estimation of the emissions is thereby based on real time abatement operation information and gas flow monitoring. Different calculation methods can be used. The impact of this is shown. The method could be expanded into a monitoring of the SEMI S23 equivalent energy consumption per tool and for major areas of the fab as well as into the monitoring of other process resources.