DRE Measurement of POU Scrubber through Applying the Dilution Factor of PFCs

Oh, Chnag Hyun; Ko, Seung Jong; Jeong, Yun Yeong
(ESH R&D Center, Hynix Semiconductor Inc, icheon-si)

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The Korean semiconductor industry makes progress various PFCs (Perfluorocompounds) reduction activities such as optimizing processes, switching to alternative gases and installing abatement system. Study on correct measurement of PFCs emission is also followed at the same time. This study was performed as first assignment to evaluate NF3 gas in Hynix semiconductor. We measured DRE (Destruction Removal Efficiency) on-site of NF3 gas from POU (Point of Use) scrubber through applying the EPA (Environmental Protection Agency) protocol (EPA 430-R-10-003, 2010). We applied method 2b which keeps process variables “unaffected” and drives measurement normally. It is applied to measure plasma-wet type POU scrubber. We used two FT-IR (Fourier Transform Infrared), a QMS (Quadrupole Mass Spectrometer) for measurement and measured the gas flow and DRE with He gas as a tracer. DRE of NF3 gas from two chambers of CVD (Chemical Vapor Deposition) cleaning process was measured and the results showed more than 90% efficiency and less than 5% relative error as well. Based on this study results, we will proceed to calculate the exact GHG emission with continuous carrying out DRE measurement of another PFCs such as CF4, C2F6 and C3F8. Key Words : PFCs, DRE, POU Scrubber, Plasma-Wet, FT-IR

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