Home > SESHA 39th Annual Symposium (2017) > Evaluation of Wet-Burn-Wet Abatement System on Semiconductor Silicon Nitride Processes

Evaluation of Wet-Burn-Wet Abatement System on Semiconductor Silicon Nitride Processes

Chang, Jack
(Texas Instruments Inc.)

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Texas Instruments evaluated a wet-burn-wet point of use abatement system on a 300mm silicon nitride process for efficiency of greenhouse gas abatement. Also, NOx and N2O emissions were monitored for both process and clean steps.

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