SESHA 39th Annual Symposium (2017)

Event Details

39th Annual International High Technology ESH Symposium and Exhibition (2017)




May 6 (Wednesday)

Keynote Presentation
The expanding role of the electronics industry in the energy sector
Brent Nelson

Foreline Plasma Abatement in Today’s Fab
Joe Van Gompel John Dickinson, Shaun Crawford Dustin Ho, Andreas Neuber Jim L’Heureux

Evaluation of Wet-Burn-Wet Abatement System on Semiconductor Silicon Nitride Processes
Jack Chang

Ammonium Nitrate / III-V
Understanding Ammonium Nitrate Hazards in Semiconductor Facilities
Thomas Roberts

Material flow of gallium arsenide and risk analysis in the III/V-semiconductor industry in Germany
Christian Clemm

Bridging the gap between bottom-up and top-down approaches for the global CF4 budget
Eleni Michalopoulou

Revision of IPCC Default PFC Emission Factors
Michael Czerniak

The Science of Exhaust Management
Adam Stover, Steve Cottle

New Regulatory Developments Affecting Fluorinated Materials
Tim Higgs


Ion Implant
A Non-Traditional Approach to Ion Implant Exhaust Reduction
Karl Olander, Steven Ballance, Joe Sweeney

Evaluation of the Performance of a Mixture of BF3+H2 from an EH&S Perspective on an Ion Implant Tool
Joseph* Despres, Edward Jones, Ying Tang

Actions to Improve Chemical Facility Safety and Security under EO 13650, Improving Chemical Facility Safety and Security, Related to the EPA Risk Management Plan (RMP) Rule and OSHA Process Safety Management (PSM) Standard
Ashley Moll, Bernie Frist

Effective Application of Risk Controls from Integrated Process Hazards Analysis Evaluations
Steven Trammell



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